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Hafnium dioxide

dioxohafnium · also: Hafnia, Nbtxr3, Hafnotrast, Hafnia (HfO2), Hafnium oxide, Bis(oxido)hafnium

FormulaHfO2
Mol. weight210.488
PubChem CID292779
InChIKeyCJNBYAVZURUTKZ-UHFFFAOYSA-N
SMILESO=[Hf]=O
86,518Patents
87Research papers
13,854Patents - last 3 years
9Papers - last 3 years

Who owns the IP

The organizations most actively patenting around this compound, ranked by referenced patent volume.

#AssigneePatents
1Taiwan Semiconductor Manufacturing Co TSMC Ltd6,668
2International Business Machines Corp2,518
3Samsung Display Co Ltd1,265
4Micron Technology Inc1,236
5GlobalFoundries US Inc1,063
6Ningde Amperex Technology Ltd1,054
7General Electric Co929
8Semiconductor Energy Laboratory Co Ltd915
9Intel Corp895
10Samsung Electronics Co Ltd862

Explore the full landscape

This preview shows the leading assignees. Cypris reveals the full ownership landscape - every filing entity, filing trends, and portfolio momentum.

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Where innovation is concentrated

Patent classifications ranked by volume reveal the technical domains with the most active filing.

#CodeAreaPatents
1H01LSemiconductor devices28,050
2H10D27,322
3H10P14,993
4H10W10,386
5H10B9,679
6Y02EClimate change mitigation: energy6,945
7C23C6,637
8B82YNanotechnology5,304
9C04B5,040
10H10KOrganic semiconductors / OLEDs4,800

AI mapped opportunity space

This preview shows where patent activity concentrates. Cypris maps the full classification landscape to surface technical whitespace and IP headroom.

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Most-cited patents

Patents ranked by forward citations reveal the foundational inventions the field continues to build on.

TitleYearAssigneeCited by
Lanthanum hafnium oxide dielectrics2007Micron Technology Inc592
Lanthanide oxide / hafnium oxide dielectric layers2007Micron Technology Inc579
Lanthanide oxide / hafnium oxide dielectric layers2007Micron Technology Inc555
Lanthanide oxide / hafnium oxide dielectrics2006Micron Technology Inc107
Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures2006GlobalFoundries Inc100

Where research is gaining momentum

Research themes ranked by publication activity show where scientific interest is accelerating around this compound.

#Research topicPapers
1interferon and immune responses1

Who's driving the science

The most-published authors working with this compound, alongside their primary affiliations.

#AuthorAffiliationPapers
1Julie MarillNanobiotix (France)4
2Naeemunnisa Mohamed AnesaryNanobiotix (France)4
3C. Le PéchouxInstitut Gustave Roussy3
4Elsa BorghiNanobiotix (France)3
5Juliette ThariatCentre François Baclesse3
6Laurent LévyNanobiotix (France)3
7Sébastien ParisNanobiotix (France)3
8Agnès PottierNanobiotix (France)2
9Audrey DarmonNanobiotix (France)2
10Blassan P. GeorgeUniversity of Johannesburg1

Research leaders

This preview lists the top authors. Cypris surfaces the full researcher landscape, their affiliations, and how scientific influence is shifting.

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The literature that defines it

The most-cited papers anchoring the scientific record for this compound.

Frequently asked questions

Common questions about this compound's patent and research landscape, answered from the underlying data.

What is the molecular formula and weight of hafnium dioxide?

Hafnium dioxide has the molecular formula HfO2 and a molecular weight of 210.488 g/mol.

Which organizations hold the most patents related to hafnium dioxide?

Taiwan Semiconductor Manufacturing Co TSMC Ltd leads with 6,668 patents, followed by International Business Machines Corp with 2,518 patents and Samsung Display Co Ltd with 1,265 patents.

What are the primary technology areas covered by hafnium dioxide patents?

The largest patent classifications are H01L (28,050 patents) covering semiconductors and electronic devices, H10D (27,322 patents) covering memory technologies, and H10P (14,993 patents) covering data storage and processing. Other significant areas include C23C (6,637 patents) for coating and surface treatment and B82Y (5,304 patents) for nanotechnology applications.

What medical applications of hafnium oxide nanoparticles are documented in recent research?

Research demonstrates use as a radioenhancer for cancer treatment. A clinical trial tested NBTXR3 (hafnium oxide nanoparticles) in patients with locally advanced soft-tissue sarcoma, with findings published in 2019 showing benefits when combined with radiotherapy. Earlier work in 2012 established fundamental techniques for nanoscale radiotherapy with hafnium oxide nanoparticles.

What is the recent patent activity trend for hafnium dioxide?

Patent filings have grown substantially, rising from 3,964 patents in 2016 to a peak of 7,262 patents in 2023. In the last three years, there have been 13,854 total patents filed. Meanwhile, academic paper output has remained modest at 9 papers in the last three years, with peak publication in 2019 at 11 papers.

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